Line Generator Optics

Line Generator Optics use a single, flat element to transform a Gaussian beam into a homogenous top-hat line profile. This method offers increased efficiency for any materials processing application such as annealing or re-crystallization of semiconductors or thin layers. Line Generator Optics achieve good uniformity with high efficiency while maintaining high damage threshold. Custom designs are available for UV to NIR wavelengths.

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Features		Applications
Good Uniformity High Efficiency UV to NIR Wavelengths Available High Damage Threshold Single Optical Element		Materials Processing Annealing and Re-crystallization of Semiconductors and Thin Layers Printing Technology Lithography Measuring Systems