Nano-Optics

The wide range of micro and nano optical applications requires optical elements with typical structure sizes beginning at several nanometers and ending in the range of millimeters. In the case of diffractive optics, it is known from the grating equation that the feature size is proportional to Lambda/NA, which implies for applications in the UV-wavelength range to typical structure lateral dimensions in a range between 1 µm down to 100 nm and below. The fabrication of products with minimum features sizes down to the sub-micron range requires high-resolution lithography techniques.

JENOPTIK Microoptics Nano Lithography is a maskless process in which we are able to pattern features with critical dimensions down to 100 nm (+/- 20 nm). Positional accuracy is +/- 40 nm. This is provided on substrates up to 7" x 7" square in fused silica, quartz glass and optical glasses. These substrates can be etched with aspect ratios as high as 1:15. Products include diffractive lenses, fine-pitched gratings, polarizing optics, as well as multi-function optics.

Features

• Flexible technology for custom structures
• No masks – only design files, “maskless” lithography
• Substrates: fused silica, quartz glass, optical glasses
• Substrate size up to 7“ x 7”
• Feature size down to 100nm
• Position accuracy ± 40nm
• CD down to 0.1 µm ± 0.02 µm
• Depth accuracy and homogeneity ± 1%
• High aspect ratio up to 1:15